Krystian Pavłov, MSc. Eng.

Research Assistant


Graduate of Faculty of Mechatronics at Warsaw University of Technology (2016). Tied to the CEZAMAT project since 2014. Finished an 8-month internship at Imec, Belgium in 2014, performing wet etching and surface cleaning processes optimization on CMOS and HSI sensors production line. Field of interest includes manufacturing of high precision amplitude and phase shifting elements utilizing standard CMOS process lines.

Areas of research

  • diffraction elements, microlenses, holography
  • microstructure characterization
  • electron and optical microscopy

Selected Publications

  1. Kaźmierczak, A., Słowikowski, M., Pavłov, K., Filipiak, M., Vervaeke, M., Tyszkiewicz, C., Ottevaere, H., Piramidowicz, R., Karasiński, P., “Efficient, low-cost optical coupling mechanism for TiO2-SiO2sol-gel derived slab waveguide surface grating coupler sensors”, (2021) 50 (4), pp. 539-549. DOI: 10.37190/OA200403
  2. Kaźmierczak, A., Słowikowski, M., Pavłov, K., Filipiak, M., Piramidowicz, R., “Polymer micro-lenses as a long-coupling-distance interfacing layer in the low-cost optical coupling solution between optical fibers and photonic integrated waveguide circuits”, (2019) 11 (4), pp. 121-123. DOI: 10.4302/plp.v11i4.964
  3. Stonio, B., Kwietniewski, N., Firek, P., Słowikowski, M., Pavłov, K., Sochacki, M., Szmidt, J., “Influence of masking materials on the quality of mapping in silicon carbide 4H-SiC dry etching processes in chlorine plasma” [Wpływ materiału maskującego na jakość odwzorowania w procesie suchego trawienia węglika krzemu 4H-SiC w plazmie chlorowej] (2019) 95 (10), pp. 158-161. DOI: 10.15199/48.2019.10.36
  4. Krzeminski, J., Skarzynski, K., Wroblewski, G., Janczak, D., Dybowska-Sarapuk, L., Lepak, S., Pavlov, K., Sloma, M., Jakubowska, M., “Aerosol jet printing head for printed microscale electronics”, (2018) 10808, art. no. 108084V, DOI: 10.1117/12.2501496
Skip to content